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F2 157nm准分子激光器镜片/F2 LASER COMPONENTS

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更新时间:2017-06-15

简要描述:

F2 157nm准分子激光器镜片/F2 LASER COMPONENTS包括 157nm铝高反射镜,分光镜,消光片/Attenuator等


 HR (0°, 157nm) R = 92 ... 95% 2 x 10 8 – 1 x 10 9 pulses*
HR (45°, 157nm) R = 90 ... 94% (random pol.)
PR (0°, 157nm) R = 50 ± 3 % 2 x 10 8 – 1 x 10 9 pulses*
PR (0°, 157nm) R = 25 ± 2 % 2 x 10 8 – 1 x 10 9 pulses*
Attenuator T = 67 ± 3 % 5 x 10 7 pulses**, no damage
Attenuator T = 33 ± 3 % 1 x 10 8 pulses***, no damage
Beam splitter T = 20 ± 3 % 1 x 10 8 pulses***, no damage
AR (0°, 157nm) 0.3 ... 0.7 %

Protected Al mirrors (optimized for 157 nm):
R=74 … 78%
• Dielectrically enhanced Al mirrors: up to
R=94% at AOI=0°
• For more information on Al mirrors see pages
122–123

Mirrors and separators for the 160nm range and the 133nm range are produced by coating techniques which were developed for F2 laser coatings.

 

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